RTP tube furnace of 1200 degree with sliding rail | cyky

RTP tube furnace is a UL certifiable compact rapid thermal processing tube (4″ I.D.) furnace with High Vacuum Station (diaphragm pump + turbo molecular pump) and KF-D25 vacuum flange assembly. It is designed for annealing semiconductor wafer or solar cell up to 3″ diameter. The furnace is heated by 8 units of 1KW halogen light around the processing tube with a max. heating rate of max. 50C/second. 50 segments precision temperature controller is built in with accuracy +/-1° C. RTP Rapid annealing tube furnace is designed for annealing semiconductor wafer or solar cell

RTP tube furnace

RTP tube furnace

Model No. CY-O1200-50IRTP
Display 7” LCD Touch Panel
Limiting temperature 1150℃
Working temperature ≤1100℃
Heating rate 0-100℃/min
Heating Zone length 400mm, constant temperature zone200mm
Corundum tube diameter OD50*1200mm
Temperature accuracy ± 1℃
Heating element Alchrome
Thermal couple K TYPE
Cooling method Double layer structure with fan cooling
Temperature control 30 steps programmable PID control
Chamber material Alumina fiber
Over-temperature alarm Yes
Over-current alarm Yes
Sealing flange S.S vacuum flange
Sliding method Manual sliding
Cooling method air forced cooling
Gas mixer One way with Float Flow Controller
Main Power 4.5Kw
Working voltage AC220V,50Hz

tube furnace is heated by halogen light around the processing tube with a max. heating rate of max. 300°C/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.

annealing tube furnace is designed for annealing semiconductor wafer or solar cell.Can be customized according to your needs.can choose according to the annealing tube furnace image and the table parameters in detail, and then contact us to get the price